Doping to create n-type semiconductor material — what is actually added? Evaluate the statement: “n-type semiconductor material is created by adding material with electron holes.” Decide whether this description is valid.

Introduction / Context:
Doping determines whether a semiconductor conducts primarily via electrons (n-type) or holes (p-type). A precise understanding of “donors” and “acceptors” helps avoid conceptual errors in device analysis and design.

Given Data / Assumptions:

• Host lattice is typically silicon.
• Donors: group 15 elements (P, As, Sb). Acceptors: group 13 (B, Al, Ga).
• Room-temperature operation unless otherwise noted.

Concept / Approach:
n-type material is made by adding donor impurities that have five valence electrons—one more than silicon’s four. This extra electron is weakly bound and becomes a mobile conduction electron, increasing electron concentration above hole concentration. Saying “add material with electron holes” actually describes p-type (acceptor) doping, where trivalent atoms create a deficiency of electrons (holes) that act as majority carriers.

Step-by-Step Solution:

Verification / Alternative check:
Hall effect measurements on n-type samples show negative Hall coefficient, confirming electrons as majority carriers due to donor doping.

Why Other Options Are Wrong:

Common Pitfalls:
Using “holes” as a generic synonym for carriers; mixing up which dopants create electrons versus holes.

Final Answer:
Incorrect