Semiconductor fundamentals: in solid-state electronics, “doping” refers to deliberately adding a very small concentration of pentavalent (donor) or trivalent (acceptor) impurity atoms into a tetravalent semiconductor lattice (such as silicon) to control carrier concentration. Validate this statement.
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ACorrect
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BIncorrect
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CTrue only for germanium, not silicon
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DTrue only when using a metal lattice
Answer
Correct Answer: Correct
Explanation
Introduction / Context:Doping is the foundational technique that turns an intrinsic semiconductor into a useful electronic material by creating n-type or p-type regions. This concept underlies diodes, bipolar junction transistors, field-effect transistors, and integrated circuits. The statement claims that doping involves adding a tiny amount of pentavalent or trivalent atoms to a tetravalent host to modify conductivity.
Given Data / Assumptions:
- Host semiconductor is tetravalent (e.g., silicon, germanium), forming a covalent lattice.
- Pentavalent dopants (group V) act as donors; trivalents (group III) act as acceptors.
- Dopant concentration is small compared with host atom density (typically parts per million to parts per billion).
- Room-temperature behavior is considered for standard device operation.
Concept / Approach:In an intrinsic lattice, each atom forms four covalent bonds. Introducing a group V dopant (such as phosphorus) contributes an extra valence electron that is weakly bound and easily ionized, yielding a free electron (n-type). Introducing a group III dopant (such as boron) creates an electron deficiency (hole) because it has only three valence electrons, forming an acceptor level that promotes hole conduction (p-type). The small quantity of dopant shifts the Fermi level and controls majority carriers without destroying the crystal structure.
Step-by-Step Solution:
1) Identify host: tetravalent semiconductor provides four covalent bonds.2) Add pentavalent dopant: donates one extra electron → donor level → n-type.3) Add trivalent dopant: accepts an electron → hole generation → p-type.4) Conclude the definition aligns with standard semiconductor physics.Verification / Alternative check:Device cross-sections (diodes, BJTs, MOSFETs) show engineered n/p regions formed by controlled dopant diffusion or ion implantation, directly confirming the described process.
Why Other Options Are Wrong:Incorrect: contradicts the accepted definition of doping.
True only for germanium: also valid for silicon and many compound semiconductors.
True only for a metal lattice: metals are not doped in this semiconductor sense.
Common Pitfalls:Confusing doping with alloying; assuming high dopant levels like alloys rather than ppm-level controlled doping; thinking dopants must be magnetic or metallic in behavior.
Final Answer:Correct