Donor dopants (pentavalent): Which of the following is a commonly used pentavalent dopant for creating n-type semiconductor material?

Introduction / Context:
Doping tailors semiconductor conductivity by adding controlled impurities. Pentavalent dopants (Group V) donate extra electrons and produce n-type material. Recognizing common dopants is essential for understanding device fabrication and the electrical behavior of junctions.

Given Data / Assumptions:

• Target: n-type doping (donor).
• Periodic table groups govern valence electron count and bonding possibilities in silicon lattices.
• Common, practical dopants are considered.

Concept / Approach:
Pentavalent atoms such as phosphorus (P), arsenic (As), and antimony (Sb) have five valence electrons. When substituted into a silicon lattice (valence 4), one electron remains weakly bound and can be easily promoted to conduction, yielding an electron-rich (n-type) semiconductor. Trivalent dopants (Group III) like boron (B) and gallium (Ga) create p-type material by accepting electrons (creating holes).

Step-by-Step Solution:

Verification / Alternative check:
Standard semiconductor texts and process notes list P, As, Sb as donor species. As is common in diffusion and ion implantation steps for forming shallow, well-controlled junctions.

Why Other Options Are Wrong:

• Boron and gallium: p-type (acceptors), not pentavalent donors.
• Neon: Inert gas; does not form the necessary covalent bonds in silicon.

Common Pitfalls:
Confusing donors and acceptors due to periodic table position. Remember: Group V → n-type; Group III → p-type.

Final Answer:
arsenic